Publication:
Determination of photoresist degradation products in O-3/DI processing
Date
| dc.contributor.author | Vankerckhoven, H. | |
| dc.contributor.author | De Smedt, F. | |
| dc.contributor.author | Van Herp, B. | |
| dc.contributor.author | Claes, Martine | |
| dc.contributor.author | De Gendt, Stefan | |
| dc.contributor.author | Heyns, Marc | |
| dc.contributor.author | Vinckier, Chris | |
| dc.contributor.imecauthor | Claes, Martine | |
| dc.contributor.imecauthor | De Gendt, Stefan | |
| dc.contributor.imecauthor | Heyns, Marc | |
| dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
| dc.date.accessioned | 2021-10-14T23:48:55Z | |
| dc.date.available | 2021-10-14T23:48:55Z | |
| dc.date.issued | 2002 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7001 | |
| dc.source.beginpage | 391 | |
| dc.source.endpage | 398 | |
| dc.source.issue | 5 | |
| dc.source.journal | Ozone Science and Engineering | |
| dc.source.volume | 24 | |
| dc.title | Determination of photoresist degradation products in O-3/DI processing | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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