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Characterizing and modeling electrical response to light for metal based EUV photoresists
Publication:
Characterizing and modeling electrical response to light for metal based EUV photoresists
Date
2016
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vaglio Pret, Alessandro
;
Kocsis, Michael
;
De Simone, Danilo
;
Vandenberghe, Geert
;
Stowers, Jason
;
Giglia, Angelo
;
De Schepper, Peter
;
Mani, Antonio
;
Biafore, John J.
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Views
1940
since deposited on 2021-10-23
442
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations
Metrics
Views
1940
since deposited on 2021-10-23
442
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations