Publication:

Accurate models for EUV Lithography

Date

2009
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorHendrickx, Eric
dc.contributor.authorLorusso, Gian
dc.contributor.authorVan Setten, Eelco
dc.contributor.authorHansen, Steve
dc.contributor.authorJiang, Jiong
dc.contributor.authorLiu, Wei
dc.contributor.authorChen, Luogi
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorLiu, Wei
dc.contributor.orcidimecLiu, Wei::0000-0002-6573-2881
dc.date.accessioned2021-10-17T22:49:06Z
dc.date.available2021-10-17T22:49:06Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15458
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate18/10/2009
dc.source.conferencelocationPrague Czech Republic
dc.title

Accurate models for EUV Lithography

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
18870.pdf
Size:
804.66 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions