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Hydrogen-plasma-enhanced thermal donor formation in n-type high-ressitivity MCZ silicon

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dc.contributor.authorSimoen, Eddy
dc.contributor.authorHuang, Y.L.
dc.contributor.authorClaeys, Cor
dc.contributor.authorRafi, J.M.
dc.contributor.authorJob, R.
dc.contributor.authorFahrner, W.R.
dc.contributor.authorVersluijs, Janko
dc.contributor.authorClauws, P.
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.accessioned2021-10-16T05:06:42Z
dc.date.available2021-10-16T05:06:42Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11213
dc.source.beginpage165
dc.source.conferenceCrystalline Defects and Contamination: Their Impact and Control in Device Manufacturing IV
dc.source.conferencedate16/09/2005
dc.source.conferencelocationGrenoble France
dc.source.endpage175
dc.title

Hydrogen-plasma-enhanced thermal donor formation in n-type high-ressitivity MCZ silicon

dc.typeProceedings paper
dspace.entity.typePublication
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