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Spin-on wafer contamination evaluated with TXRF and SIMS

Date

2007
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dc.contributor.authorErhke, Hans Ulrich
dc.contributor.authorSears, Adam
dc.contributor.authorGreithanner, Stefan
dc.contributor.authorVan Hoeymissen, Jan
dc.contributor.authorRip, Jens
dc.contributor.imecauthorRip, Jens
dc.date.accessioned2021-10-16T16:02:00Z
dc.date.available2021-10-16T16:02:00Z
dc.date.embargo9999-12-31
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12129
dc.source.conference12th Conference on Total Reflection X-Ray Fluorescence Analysis and Related Methods - TXRF
dc.source.conferencedate18/06/2008
dc.source.conferencelocationTrento Italy
dc.title

Spin-on wafer contamination evaluated with TXRF and SIMS

dc.typeOral presentation
dspace.entity.typePublication
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