Publication:
Correlation between hot carrier stress, oxide breakdown and gate leakage current for monitoring plasma processing induced damage on gate oxide
Date
| dc.contributor.author | Zhichun, Wang | |
| dc.contributor.author | Ackaert, J. | |
| dc.contributor.author | Salm, C. | |
| dc.contributor.author | de Backer, E. | |
| dc.contributor.author | Van den Bosch, Geert | |
| dc.contributor.author | Zawalski, Wade | |
| dc.contributor.imecauthor | Van den Bosch, Geert | |
| dc.contributor.orcidimec | Van den Bosch, Geert::0000-0001-9971-6954 | |
| dc.date.accessioned | 2021-10-15T00:15:28Z | |
| dc.date.available | 2021-10-15T00:15:28Z | |
| dc.date.issued | 2002 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7109 | |
| dc.source.beginpage | 242 | |
| dc.source.conference | Proceedings of the 9th International Symposium on the Physical and Failure Analysis of Integrated Circuits - IPFA | |
| dc.source.conferencedate | 8/07/2002 | |
| dc.source.conferencelocation | Singapore | |
| dc.source.endpage | 245 | |
| dc.title | Correlation between hot carrier stress, oxide breakdown and gate leakage current for monitoring plasma processing induced damage on gate oxide | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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