Publication:

Deep learning-based defect detection using large FOV SEM for 28 nm pitch BEOL layer patterned with 0.33NA single exposure EUV

Date

2021
Proceedings Paper
https://doi.org/10.1117/12.2600954
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dc.contributor.authorDas, Sayantan
dc.contributor.authorSah, Kaushik
dc.contributor.authorLiang, Ardis
dc.contributor.authorRoy, Hemanta
dc.contributor.authorTran, Kha
dc.contributor.authorBabu, Binesh
dc.contributor.authorHegde, Arjun
dc.contributor.authorCross, Andrew
dc.contributor.authorLeray, Philippe
dc.contributor.authorHalder, Sandip
dc.contributor.imecauthorDas, Sayantan
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorHalder, Sandip
dc.contributor.orcidext0000-0002-3031-0726
dc.contributor.orcidimecLeray, Philippe::0000-0002-1086-270X
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecDas, Sayantan::0000-0002-3031-0726
dc.date.accessioned2022-08-31T08:15:37Z
dc.date.available2022-05-22T02:19:06Z
dc.date.available2022-06-16T06:41:59Z
dc.date.available2022-07-08T08:38:21Z
dc.date.available2022-08-05T15:12:22Z
dc.date.available2022-08-31T08:15:37Z
dc.date.issued2021
dc.identifier.doi10.1117/12.2600954
dc.identifier.eisbn978-1-5106-4553-0
dc.identifier.isbn978-1-5106-4552-3
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39870
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage118540Y
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 27-OCT 01, 2021
dc.source.conferencelocationOnline
dc.source.journalProceedings of SPIE
dc.source.numberofpages11
dc.source.volume11854
dc.title

Deep learning-based defect detection using large FOV SEM for 28 nm pitch BEOL layer patterned with 0.33NA single exposure EUV

dc.typeProceedings paper
dspace.entity.typePublication
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