Publication:
Self-aligned block and fully self-aligned via for iN5 Metal 2 Self-aligned quadruple patterning
Date
| dc.contributor.author | Vincent, Benjamin | |
| dc.contributor.author | Franke, Joern-Holger | |
| dc.contributor.author | Juncker, Aurelie | |
| dc.contributor.author | Lazzarino, Frederic | |
| dc.contributor.author | Murdoch, Gayle | |
| dc.contributor.author | Halder, Sandip | |
| dc.contributor.author | Ervin, Joseph | |
| dc.contributor.imecauthor | Vincent, Benjamin | |
| dc.contributor.imecauthor | Franke, Joern-Holger | |
| dc.contributor.imecauthor | Lazzarino, Frederic | |
| dc.contributor.imecauthor | Murdoch, Gayle | |
| dc.contributor.imecauthor | Halder, Sandip | |
| dc.contributor.orcidimec | Franke, Joern-Holger::0000-0002-3571-1633 | |
| dc.contributor.orcidimec | Lazzarino, Frederic::0000-0001-7961-9727 | |
| dc.contributor.orcidimec | Halder, Sandip::0000-0002-6314-2685 | |
| dc.contributor.orcidimec | Murdoch, Gayle::0000-0002-6833-220X | |
| dc.date.accessioned | 2021-10-26T08:46:28Z | |
| dc.date.available | 2021-10-26T08:46:28Z | |
| dc.date.issued | 2018 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/32214 | |
| dc.identifier.url | https://doi.org/10.1117/12.2298761 | |
| dc.source.beginpage | 105830W | |
| dc.source.conference | Extreme Ultraviolet (EUV) Lithography IX | |
| dc.source.conferencedate | 25/02/2018 | |
| dc.source.conferencelocation | San Jose, CA USA | |
| dc.title | Self-aligned block and fully self-aligned via for iN5 Metal 2 Self-aligned quadruple patterning | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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