Publication:
p+poly-Si1-xGex gate material for future high-speed nanoscale CMOS circuits
Date
| dc.contributor.author | Yousif, M. Y. A. | |
| dc.contributor.author | Willander, M. | |
| dc.contributor.author | Lundgren, P. | |
| dc.contributor.author | Caymax, Matty | |
| dc.contributor.imecauthor | Caymax, Matty | |
| dc.date.accessioned | 2021-10-14T14:23:38Z | |
| dc.date.available | 2021-10-14T14:23:38Z | |
| dc.date.issued | 2000 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/4966 | |
| dc.source.beginpage | 419 | |
| dc.source.conference | Proceedings GHz 2000 Symposium.; Gothenburg, Sweden. | |
| dc.source.conferencelocation | ||
| dc.title | p+poly-Si1-xGex gate material for future high-speed nanoscale CMOS circuits | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |