Publication:

2D inner assist features for 0.55NA: mask wafer data characterization

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3071997
Simple item page Full metadata Statistics
 
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtualsource.departmentbe5739a1-8adb-49d2-b4bc-3bb1c5a77f86
cris.virtualsource.orcidbe5739a1-8adb-49d2-b4bc-3bb1c5a77f86
dc.contributor.authorLeitao, Sofia
dc.contributor.authorDhagat, Paml
dc.contributor.authorChen, Jeremy
dc.contributor.authorPandey, Nitesh
dc.contributor.authorHennerkes, Christoph
dc.date.accessioned2026-03-31T07:10:52Z
dc.date.available2026-03-31T07:10:52Z
dc.date.createdwos2026-02-20
dc.date.issued2025
dc.identifier.doi10.1117/12.3071997
dc.identifier.isbn978-1-5106-9320-3
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/58972
dc.language.isoeng
dc.provenance.editstepusergreet.vanhoof@imec.be
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage136871I
dc.source.conferencePhotomask Technology
dc.source.conferencedate2025-09-22
dc.source.conferencelocationMonterey
dc.source.journalPHOTOMASK TECHNOLOGY 2025
dc.source.numberofpages8
dc.title

2D inner assist features for 0.55NA: mask wafer data characterization

dc.typeProceedings paper
dspace.entity.typePublication
imec.internal.crawledAt2026-02-23
imec.internal.sourcecrawler
Files
Publication available in collections:
Conference contributions