Publication:

Titanium silicidation of submicron poly-SiGe runners

Date

1998
Proceedings Paper
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dc.contributor.authorAlves Donaton, Ricardo
dc.contributor.authorStucchi, Michele
dc.contributor.authorJin, S.
dc.contributor.authorBender, Hugo
dc.contributor.authorMaex, Karen
dc.contributor.authorVantomme, Andre
dc.contributor.authorLangouche, G.
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorVantomme, Andre
dc.date.accessioned2021-09-30T11:24:54Z
dc.date.available2021-09-30T11:24:54Z
dc.date.embargo9999-12-31
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2339
dc.source.beginpage565
dc.source.conferenceAdvanced Metallization and Interconnect Systems for ULSI Applications in 1997
dc.source.conferencedate30/09/1997
dc.source.conferencelocationSan Diego, CA USA
dc.source.endpage570
dc.title

Titanium silicidation of submicron poly-SiGe runners

dc.typeProceedings paper
dspace.entity.typePublication
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