Nucleation and growth kinetics of electrodeposited  Ni films on Si(100) surfaces

dc.contributor.author	Philipsen, Harold
dc.contributor.author	Jehoul, Hannes
dc.contributor.author	Inoue, Fumihiro
dc.contributor.author	Vandersmissen, Kevin
dc.contributor.author	Yang, Liu
dc.contributor.author	Struyf, Herbert
dc.contributor.author	van Dorp, Dennis
dc.contributor.imecauthor	Philipsen, Harold
dc.contributor.imecauthor	Jehoul, Hannes
dc.contributor.imecauthor	Inoue, Fumihiro
dc.contributor.imecauthor	Vandersmissen, Kevin
dc.contributor.imecauthor	Struyf, Herbert
dc.contributor.imecauthor	van Dorp, Dennis
dc.contributor.orcidimec	Philipsen, Harold::0000-0002-5029-1104
dc.contributor.orcidimec	van Dorp, Dennis::0000-0002-1085-4232
dc.date.accessioned	2021-10-24T10:57:16Z
dc.date.available	2021-10-24T10:57:16Z
dc.date.issued	2017
dc.identifier.issn	0013-4686
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/29169
dc.identifier.url	http://dx.doi.org/10.1016/j.electacta.2017.02.010
dc.source.beginpage	407
dc.source.endpage	417
dc.source.journal	Electrochimica Acta
dc.source.volume	230
dc.title	Nucleation and growth kinetics of electrodeposited Ni films on Si(100) surfaces
dc.type	Journal article
dspace.entity.type	Publication
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