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Preparation and properties of ultrathin high-k dielectric films by aqueous chemical solution deposition

Date

2010
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dc.contributor.authorHardy, An
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVan Bael, Marlies
dc.contributor.imecauthorHardy, An
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorVan Bael, Marlies
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecVan Bael, Marlies::0000-0002-5516-7962
dc.date.accessioned2021-10-18T16:53:23Z
dc.date.available2021-10-18T16:53:23Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17224
dc.source.conferenceIntern. Symp. on the Applications of Ferroelectrics - European Conf. on the Applications of Polar Dielectrics - ISAF-ECAPD
dc.source.conferencedate9/08/2010
dc.source.conferencelocationEdinburgh UK
dc.title

Preparation and properties of ultrathin high-k dielectric films by aqueous chemical solution deposition

dc.typeOral presentation
dspace.entity.typePublication
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