Publication:

Epitaxial CoSi2 formation by a Cr or Mo interlayer

Date

2000
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorDetavernier, C.
dc.contributor.authorVan Meirhaeghe, R. L.
dc.contributor.authorCardon, F.
dc.contributor.authorMaex, Karen
dc.contributor.authorBrijs, Bert
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-10-14T12:54:54Z
dc.date.available2021-10-14T12:54:54Z
dc.date.embargo9999-12-31
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4340
dc.source.beginpageC10.2
dc.source.conferenceGate Stack and Silicide Issues in Silicon Processing
dc.source.conferencelocation
dc.title

Epitaxial CoSi2 formation by a Cr or Mo interlayer

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
4324.pdf
Size:
364.96 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions