Publication:

Double patterning induced process bias induced for various LPL alternatives

Date

2010
Proceedings Paper
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dc.contributor.authorWong, Patrick
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorWiaux, Vincent
dc.contributor.authorGronheid, Roel
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.date.accessioned2021-10-19T00:36:07Z
dc.date.available2021-10-19T00:36:07Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18369
dc.source.conferenceInternational Symposium on Lithography Extensions
dc.source.conferencedate20/10/2010
dc.source.conferencelocationKobe Japan
dc.title

Double patterning induced process bias induced for various LPL alternatives

dc.typeProceedings paper
dspace.entity.typePublication
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