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Epitaxial staircase structure for the calibration of electrical characterisation techniques

Date

1997
Proceedings Paper
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dc.contributor.authorClarysse, Trudo
dc.contributor.authorCaymax, Matty
dc.contributor.authorDe Wolf, Peter
dc.contributor.authorTrenkler, Thomas
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorMcMurray, J. S.
dc.contributor.authorKim, J.
dc.contributor.authorWilliams, C. C.
dc.contributor.authorClark, J G.
dc.contributor.authorNeubauer, G.
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-09-30T08:00:50Z
dc.date.available2021-09-30T08:00:50Z
dc.date.embargo9999-12-31
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1774
dc.source.beginpage30.1
dc.source.conferenceProceedings 4th Int. Worksh. on the Measurement, Characterization and Modelling of Ultra-Shallow Doping Profiles in Semiconducto
dc.source.conferencedate6/04/1997
dc.source.conferencelocationResearch Triangle Park, NC USA
dc.source.endpage30.1
dc.title

Epitaxial staircase structure for the calibration of electrical characterisation techniques

dc.typeProceedings paper
dspace.entity.typePublication
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