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Comparing positive and negative tone development process for printing the metal and contact layers of the 32- and 22-nm node
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Comparing positive and negative tone development process for printing the metal and contact layers of the 32- and 22-nm node
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Date
2010
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Bekaert, Joost
;
Van Look, Lieve
;
Truffert, Vincent
;
Lazzarino, Frederic
;
Vandenberghe, Geert
;
Reybrouck, Mario
;
Tarutani, Shinji
Journal
Journal of Micro/Nanolithography MEMS and MOEMS
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Views
2031
since deposited on 2021-10-18
2
last month
1
last week
Acq. date: 2026-08-05
Citations