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Comparing positive and negative tone development process for printing the metal and contact layers of the 32- and 22-nm node
Publication:
Comparing positive and negative tone development process for printing the metal and contact layers of the 32- and 22-nm node
Date
2010-12
Journal article
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21454.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Bekaert, Joost
;
Van Look, Lieve
;
Truffert, Vincent
;
Lazzarino, Frederic
;
Vandenberghe, Geert
;
Reybrouck, Mario
;
Tarutani, Shinji
Journal
Journal of Micro/Nanolithography MEMS and MOEMS
Abstract
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2022
since deposited on 2021-10-18
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Acq. date: 2025-10-28
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Metrics
Views
2022
since deposited on 2021-10-18
1
last week
Acq. date: 2025-10-28
Citations