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Development and evaluation of photodefinable wafer level underfill

Date

2015
Journal article
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dc.contributor.authorMitsukura, Kazuyuki
dc.contributor.authorSaisyo, Ryouta
dc.contributor.authorMakino, Tatsuya
dc.contributor.authorHatakeyama, Keiichi
dc.contributor.authorMinegishi, Tomonori
dc.contributor.authorWang, Teng
dc.contributor.authorDaily, Robert
dc.contributor.authorDuval, Fabrice
dc.contributor.authorRebibis, Kenneth June
dc.contributor.authorMiller, Andy
dc.contributor.authorBeyne, Eric
dc.contributor.imecauthorDuval, Fabrice
dc.contributor.imecauthorRebibis, Kenneth June
dc.contributor.imecauthorMiller, Andy
dc.contributor.imecauthorBeyne, Eric
dc.contributor.orcidimecBeyne, Eric::0000-0002-3096-050X
dc.date.accessioned2021-10-22T21:08:47Z
dc.date.available2021-10-22T21:08:47Z
dc.date.issued2015
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25653
dc.identifier.urlhttps://www.jstage.jst.go.jp/article/photopolymer/28/2/28_229/_article
dc.source.beginpage229
dc.source.endpage232
dc.source.issue2
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.volume28
dc.title

Development and evaluation of photodefinable wafer level underfill

dc.typeJournal article
dspace.entity.typePublication
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