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EUV mask defect inspection for the 3nm technology node
Publication:
EUV mask defect inspection for the 3nm technology node
Date
2023
Proceedings Paper
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1.47 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hermans, Yannick
;
Heil, Tilmann
;
Capelli, Renzo
;
Szafranek, Bartholomaeus
;
Rhinow, Daniel
;
Mette, Gerson
;
Salg, Patrick
;
Hermanns, Chistian Felix
;
Dey, Bappaditya
;
Halipre, Luc
;
Trivkovic, Darko
;
Rincon Delgadillo, Paulina
;
Marschner, Thomas
;
Halder, Sandip
Journal
Proceedings of SPIE
Abstract
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Downloads
119
since deposited on 2023-10-30
Acq. date: 2025-10-23
Views
649
since deposited on 2023-10-30
Acq. date: 2025-10-23
Citations
Metrics
Downloads
119
since deposited on 2023-10-30
Acq. date: 2025-10-23
Views
649
since deposited on 2023-10-30
Acq. date: 2025-10-23
Citations