Publication:

EUV mask defect inspection for the 3nm technology node

Date

2023
Proceedings Paper
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Published version 1.47 MB

Author(s)

Hermans, Yannick  
;
Heil, Tilmann
;
Capelli, Renzo
;
Szafranek, Bartholomaeus
;
Rhinow, Daniel
;
Mette, Gerson
;
Salg, Patrick
;
Hermanns, Chistian Felix
;
Dey, Bappaditya  
;
Halipre, Luc  
;
Trivkovic, Darko  
;
Rincon Delgadillo, Paulina  
;
Marschner, Thomas
;
Halder, Sandip  

Journal

Proceedings of SPIE

Abstract

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225 since deposited on 2023-10-30
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