Publication:

Atomic layer deposition of novel interface layers on III-V channel devices

Date

 
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0001-8220-870X
cris.virtual.orcid#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0002-1577-6050
cris.virtual.orcid#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0002-8062-3165
cris.virtual.orcid0000-0003-3407-2742
cris.virtualsource.department97013840-4a92-4f62-9440-b4729dd38e27
cris.virtualsource.departmentc0245470-e268-45df-b01d-f51923fd4d4a
cris.virtualsource.department8f2eba94-8478-45df-9820-022166ffc6fa
cris.virtualsource.department1633115d-1927-4fb8-8639-10e622f65050
cris.virtualsource.departmentb0d25bb3-47fb-4796-aac0-8dbbcc0c5614
cris.virtualsource.departmentc807a03a-358d-4274-b622-dee889a60454
cris.virtualsource.department70ac7f56-1f12-4c30-bf36-971557e3129d
cris.virtualsource.orcid97013840-4a92-4f62-9440-b4729dd38e27
cris.virtualsource.orcidc0245470-e268-45df-b01d-f51923fd4d4a
cris.virtualsource.orcid8f2eba94-8478-45df-9820-022166ffc6fa
cris.virtualsource.orcid1633115d-1927-4fb8-8639-10e622f65050
cris.virtualsource.orcidb0d25bb3-47fb-4796-aac0-8dbbcc0c5614
cris.virtualsource.orcidc807a03a-358d-4274-b622-dee889a60454
cris.virtualsource.orcid70ac7f56-1f12-4c30-bf36-971557e3129d
dc.contributor.authorTang, Fu
dc.contributor.authorJiang, Xiaoqiang
dc.contributor.authorXie, Qi
dc.contributor.authorGivens, Michael
dc.contributor.authorMaes, Jan
dc.contributor.authorSioncke, Sonja
dc.contributor.authorIvanov, Tsvetan
dc.contributor.authorNyns, Laura
dc.contributor.authorLin, Dennis
dc.contributor.authorCollaert, Nadine
dc.contributor.imecauthorXie, Qi
dc.contributor.imecauthorGivens, Michael
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorLin, Dennis
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.accessioned2021-10-24T14:44:40Z
dc.date.available2021-10-24T14:44:40Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29551
dc.source.beginpageAA2-TuA8
dc.source.conferenceAVS 17th International Conference on Atomic Layer Deposition - ALD
dc.source.conferencedate15/07/2017
dc.source.conferencelocationDenver, CO USA
dc.title

Atomic layer deposition of novel interface layers on III-V channel devices

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections: