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Atomic layer deposition of novel interface layers on III-V channel devices

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dc.contributor.authorTang, Fu
dc.contributor.authorJiang, Xiaoqiang
dc.contributor.authorXie, Qi
dc.contributor.authorGivens, Michael
dc.contributor.authorMaes, Jan
dc.contributor.authorSioncke, Sonja
dc.contributor.authorIvanov, Tsvetan
dc.contributor.authorNyns, Laura
dc.contributor.authorLin, Dennis
dc.contributor.authorCollaert, Nadine
dc.contributor.imecauthorXie, Qi
dc.contributor.imecauthorGivens, Michael
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorLin, Dennis
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.accessioned2021-10-24T14:44:40Z
dc.date.available2021-10-24T14:44:40Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29551
dc.source.beginpageAA2-TuA8
dc.source.conferenceAVS 17th International Conference on Atomic Layer Deposition - ALD
dc.source.conferencedate15/07/2017
dc.source.conferencelocationDenver, CO USA
dc.title

Atomic layer deposition of novel interface layers on III-V channel devices

dc.typeProceedings paper
dspace.entity.typePublication
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