Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
Demonstration of metal-gated low Vt n-MOSFETs using a Poly-Si/TaN/Dy2O3/SiON gate stack with a scaled EOT value
Publication:
Demonstration of metal-gated low Vt n-MOSFETs using a Poly-Si/TaN/Dy2O3/SiON gate stack with a scaled EOT value
Copy permalink
Date
2007
Journal article
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Yu, HongYu
;
Singanamalla, Raghunath
;
Ragnarsson, Lars-Ake
;
Chang, Vincent
;
Cho, Hag-Ju
;
Mitsuhashi, Riichirou
;
Adelmann, Christoph
;
Van Elshocht, Sven
;
Lehnen, Peer
;
Chang, Shou-Zen
;
Yin, K.M.
;
Schram, Tom
;
Kubicek, Stefan
;
De Gendt, Stefan
;
Absil, Philippe
;
De Meyer, Kristin
;
Biesemans, Serge
Journal
IEEE Electron Device Letters
Abstract
Description
Statistics
Views
1887
since deposited on 2021-10-16
Acq. date: 2026-01-25
Citations
Statistics
Views
1887
since deposited on 2021-10-16
Acq. date: 2026-01-25
Citations