Publication:

EXLE-SIMS: dramatically enhanced accuracy for dose loss metrology

Date

 
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorVos, Rita
dc.contributor.authorSalima, A.J.
dc.contributor.authorMerkulov, A.
dc.contributor.authorNakajima, K.
dc.contributor.authorKimura, K.
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorVos, Rita
dc.date.accessioned2021-10-17T12:14:59Z
dc.date.available2021-10-17T12:14:59Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14710
dc.source.beginpage109
dc.source.conference17th International Conference in Ion Implantation Technology - IIT
dc.source.conferencedate8/06/2008
dc.source.conferencelocationMonterey, CA USA
dc.source.endpage112
dc.title

EXLE-SIMS: dramatically enhanced accuracy for dose loss metrology

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
16932.pdf
Size:
889.46 KB
Format:
Adobe Portable Document Format
Publication available in collections: