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Bottom-up SiO2 embedded carbon nanotube electrodes with superior performance for integration in implantable neural microsystems

Date

2012
Journal article
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dc.contributor.authorMusa, Silke
dc.contributor.authorRand, Danielle
dc.contributor.authorCott, Daire
dc.contributor.authorLoo, Josine
dc.contributor.authorBartic, Carmen
dc.contributor.authorNuttin, Bart
dc.contributor.authorBorghs, Gustaaf
dc.contributor.imecauthorCott, Daire
dc.contributor.imecauthorBartic, Carmen
dc.contributor.imecauthorBorghs, Gustaaf
dc.date.accessioned2021-10-20T13:44:33Z
dc.date.available2021-10-20T13:44:33Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.issn1936-0851
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21179
dc.identifier.urlhttp://pubs.acs.org/doi/abs/10.1021/nn201609u
dc.source.beginpage4615
dc.source.endpage4628
dc.source.issue6
dc.source.journalACS Nano
dc.source.volume6
dc.title

Bottom-up SiO2 embedded carbon nanotube electrodes with superior performance for integration in implantable neural microsystems

dc.typeJournal article
dspace.entity.typePublication
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