Publication:

Distribution of metal contamination in SiO2/Si systems

Date

1999
Meeting abstract
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dc.contributor.authorMertens, Paul
dc.contributor.authorJacobs, Leon
dc.contributor.authorGoris, Karen
dc.contributor.authorKenis, Karine
dc.contributor.authorLoewenstein, Lee
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorBearda, Twan
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVos, Rita
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-14T11:30:47Z
dc.date.available2021-10-14T11:30:47Z
dc.date.embargo9999-12-31
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3676
dc.source.beginpage1107
dc.source.conferenceElectrochemical Society Fall Meeting: 6th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate17/10/1999
dc.source.conferencelocationHonolulu, HI USA
dc.title

Distribution of metal contamination in SiO2/Si systems

dc.typeMeeting abstract
dspace.entity.typePublication
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