1/f noise measurements for faster evaluation of electromigration in advanced microelectronics interconnections

dc.contributor.author	Beyne, Sofie
dc.contributor.author	Croes, Kristof
dc.contributor.author	De Wolf, Ingrid
dc.contributor.author	Tokei, Zsolt
dc.contributor.imecauthor	Beyne, Sofie
dc.contributor.imecauthor	Croes, Kristof
dc.contributor.imecauthor	De Wolf, Ingrid
dc.contributor.imecauthor	Tokei, Zsolt
dc.contributor.orcidimec	Croes, Kristof::0000-0002-3955-0638
dc.contributor.orcidimec	De Wolf, Ingrid::0000-0003-3822-5953
dc.date.accessioned	2021-10-23T10:07:09Z
dc.date.available	2021-10-23T10:07:09Z
dc.date.issued	2016
dc.identifier.issn	0021-8979
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/26340
dc.identifier.url	http://scitation.aip.org/content/aip/journal/jap/119/18/10.1063/1.4947582
dc.source.beginpage	184302
dc.source.issue	18
dc.source.journal	Journal of Applied Physics
dc.source.volume	119
dc.title	1/f noise measurements for faster evaluation of electromigration in advanced microelectronics interconnections
dc.type	Journal article
dspace.entity.type	Publication
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