Publication:
Comparative study of rapid and classical thermal phosphorus diffusion in polycrystalline silicon thin films
Date
| dc.contributor.author | Bourdais, S. | |
| dc.contributor.author | Beaucarne, Guy | |
| dc.contributor.author | Slaoui, A. | |
| dc.contributor.author | Poortmans, Jef | |
| dc.contributor.author | Semmache, B. | |
| dc.contributor.author | Dubois, C. | |
| dc.contributor.imecauthor | Poortmans, Jef | |
| dc.contributor.orcidimec | Poortmans, Jef::0000-0003-2077-2545 | |
| dc.date.accessioned | 2021-10-06T10:45:12Z | |
| dc.date.available | 2021-10-06T10:45:12Z | |
| dc.date.issued | 1999 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3266 | |
| dc.source.conference | International Photovoltaic Science and Engineering Conference; September 1999; Sapporo, Japan. | |
| dc.title | Comparative study of rapid and classical thermal phosphorus diffusion in polycrystalline silicon thin films | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
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