Publication:

Implanted photoresist remover for advanced nodes including SiGe, Ge and high k-metals

Date

2013
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorBraun, S.
dc.contributor.authorVos, Rita
dc.contributor.authorKlipp, Andreas
dc.contributor.authorClaes, Martine
dc.contributor.authorBittner, Christian
dc.contributor.authorAlbert, Johan
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorStruyf, Herbert
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-21T06:49:48Z
dc.date.available2021-10-21T06:49:48Z
dc.date.embargo9999-12-31
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22077
dc.source.beginpage17
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XI - UCPSS
dc.source.conferencedate17/09/2012
dc.source.conferencelocationGent Belgium
dc.source.endpage20
dc.title

Implanted photoresist remover for advanced nodes including SiGe, Ge and high k-metals

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
28096.pdf
Size:
195.31 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions