Characterization of porous structure in ultra-low-k dielectrics by depositing thin conductive cap layers

dc.contributor.author	Iacopi, Francesca
dc.contributor.author	Tokei, Zsolt
dc.contributor.author	Stucchi, Michele
dc.contributor.author	Brongersma, Sywert
dc.contributor.author	Vanhaeren, Danielle
dc.contributor.author	Maex, Karen
dc.contributor.imecauthor	Tokei, Zsolt
dc.contributor.imecauthor	Stucchi, Michele
dc.contributor.imecauthor	Brongersma, Sywert
dc.contributor.imecauthor	Vanhaeren, Danielle
dc.contributor.imecauthor	Maex, Karen
dc.contributor.orcidimec	Brongersma, Sywert::0000-0002-1755-3897
dc.contributor.orcidimec	Vanhaeren, Danielle::0000-0001-8624-9533
dc.date.accessioned	2021-10-15T04:59:10Z
dc.date.available	2021-10-15T04:59:10Z
dc.date.issued	2003
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/7677
dc.source.beginpage	123
dc.source.endpage	131
dc.source.issue	1_2
dc.source.journal	Microelectronic Engineering
dc.source.volume	65
dc.title	Characterization of porous structure in ultra-low-k dielectrics by depositing thin conductive cap layers
dc.type	Journal article
dspace.entity.type	Publication
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