Why is a distribution license required?*

NON-EXCLUSIVE DISTRIBUTION LICENSE

By clicking through this license, you (the author or copyright owner, or as duly authorized by the author(s) and copyright owner(s) including any co-authors and co-owners) grant to imec Publications Repository a non-exclusive, non-transferable and perpetual right to hold, reproduce, translate (as defined below), and/or distribute your submission within imec and worldwide in print and electronic format and in any medium, subject to appropriate embargos indicated by you or applied by repository staff in line with requirements of external bodies.

You agree that imec Publications Repository may, without changing the content, convert the submission to any medium or format for the purpose of preservation.

You also agree that imec Publications Repository may keep more than one copy of this submission for purposes of security, back-up and preservation.

You agree that imec Publications Repository may distribute copies of the submission worldwide, in electronic format via any medium for the purpose of free access without charge.

You confirm that the submission is an original work, and that you have the right to grant the rights contained in this license. You also confirm that your submission does not, to the best of your knowledge, infringe upon anyone's copyright.

If the submission contains material for which you do not hold copyright, you confirm that sufficient permissions have been obtained to grant imec the rights required by this license, and that such jointly owned or third-party owned material is clearly identified and acknowledged within the text or content of the submission.

If the submission has been commissioned, sponsored or supported by any organization other than imec, you have fulfilled any right of review or other obligations required by such contract or agreement. The above rights are subject to any restriction agreed with a third party which still exists on publication of the submission and which I have expressly notified to imec Publications Repository at the time of deposit.

Imec Publications Repository will clearly identify your name(s) as the author(s) or owner(s) of the submission, and will not make any alteration, other than as allowed by this license, to your submission.

Imec Publications Repository reserves the right to remove the submission for administrative reasons, or in accordance with the repository takedown policy. Imec is under no obligation to take legal action on your behalf, or on behalf of any other rights holder(s) if the submission breaches intellectual property rights or is otherwise subject to legal dispute.

3D Mask modeling for EUV lithography

Date

Files

Author(s)

Journal

Abstract

Description

Metrics

Views

Citations

Metrics

Views

Citations