Optimization of low-tempurature silicon nitride processes for improvement of device performance

dc.contributor.author	Sleeckx, Erik
dc.contributor.author	Schaekers, Marc
dc.contributor.author	Shi, Xiaoping
dc.contributor.author	Kunnen, Eddy
dc.contributor.author	Degroote, Bart
dc.contributor.author	Jurczak, Gosia
dc.contributor.author	de Potter de ten Broeck, Muriel
dc.contributor.author	Augendre, Emmanuel
dc.contributor.imecauthor	Sleeckx, Erik
dc.contributor.imecauthor	Schaekers, Marc
dc.contributor.imecauthor	Jurczak, Gosia
dc.contributor.imecauthor	de Potter de ten Broeck, Muriel
dc.contributor.orcidimec	Sleeckx, Erik::0000-0003-2560-6132
dc.contributor.orcidimec	Schaekers, Marc::0000-0002-1496-7816
dc.date.accessioned	2021-10-15T16:18:30Z
dc.date.available	2021-10-15T16:18:30Z
dc.date.issued	2004
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/9610
dc.source.conference	13th Workshop on Dielectrics in Microelectronics - WODIM
dc.source.conferencedate	28/06/2004
dc.source.conferencelocation	Kinsale Ireland
dc.title	Optimization of low-tempurature silicon nitride processes for improvement of device performance
dc.type	Proceedings paper
dspace.entity.type	Publication
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