Publication:

Logic and memory patterning breakthrough using High-NA lithography

Date

2024
Proceedings Paper
https://doi.org/10.1117/12.3047176
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dc.contributor.authorBlanco, Victor
dc.contributor.authorRoy, S.
dc.contributor.authorChowrira, B.
dc.contributor.authorPham, Van Tuong
dc.contributor.authorWouters, J.
dc.contributor.authorDas, S.
dc.contributor.authorDecoster, Stefan
dc.contributor.authorLeray, Philippe
dc.contributor.authorLiu, Ru-Gun
dc.contributor.authorRonse, Kurt
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorFoubert, Philippe
dc.contributor.authorRutigliani, V. D.
dc.contributor.authorSuh, Hyo Seon
dc.contributor.authorGupta, Mihir
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorDusa, Mircea
dc.contributor.authorBeral, Christophe
dc.contributor.authorPhilipsen, Vicky
dc.contributor.imecauthorCarballo, V. M. Blanco
dc.contributor.imecauthorRoy, S.
dc.contributor.imecauthorChowrira, B.
dc.contributor.imecauthorPham, T.
dc.contributor.imecauthorWouters, J.
dc.contributor.imecauthorDas, S.
dc.contributor.imecauthorDecoster, S.
dc.contributor.imecauthorLeray, P.
dc.contributor.imecauthorLiu, R. G.
dc.contributor.imecauthorRonse, K.
dc.contributor.imecauthorVandenberghe, G.
dc.contributor.imecauthorNiroomand, A.
dc.contributor.imecauthorFoubert, P.
dc.contributor.imecauthorRutigliani, V. D.
dc.contributor.imecauthorSuh, H. S.
dc.contributor.imecauthorGupta, M.
dc.contributor.imecauthorde Simone, D.
dc.contributor.imecauthorDusa, M.
dc.contributor.imecauthorBeral, C.
dc.contributor.imecauthorPhilipsen, V.
dc.date.accessioned2025-08-29T03:57:12Z
dc.date.available2025-08-29T03:57:12Z
dc.date.issued2024
dc.identifier.doi10.1117/12.3047176
dc.identifier.eisbn978-1-5106-8158-3
dc.identifier.isbn978-1-5106-8157-6
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/46128
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage1321604
dc.source.conference2024 Conference on Photomask Technology
dc.source.conferencedate2024-09-29
dc.source.conferencelocationMonterey
dc.source.journalProceedings of SPIE
dc.source.numberofpages9
dc.title

Logic and memory patterning breakthrough using High-NA lithography

dc.typeProceedings paper
dspace.entity.typePublication
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