Publication:
Logic and memory patterning breakthrough using High-NA lithography
| dc.contributor.author | Blanco, Victor | |
| dc.contributor.author | Roy, S. | |
| dc.contributor.author | Chowrira, B. | |
| dc.contributor.author | Pham, Van Tuong | |
| dc.contributor.author | Wouters, J. | |
| dc.contributor.author | Das, S. | |
| dc.contributor.author | Decoster, Stefan | |
| dc.contributor.author | Leray, Philippe | |
| dc.contributor.author | Liu, Ru-Gun | |
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.author | Vandenberghe, Geert | |
| dc.contributor.author | Niroomand, Ardavan | |
| dc.contributor.author | Foubert, Philippe | |
| dc.contributor.author | Rutigliani, V. D. | |
| dc.contributor.author | Suh, Hyo Seon | |
| dc.contributor.author | Gupta, Mihir | |
| dc.contributor.author | De Simone, Danilo | |
| dc.contributor.author | Dusa, Mircea | |
| dc.contributor.author | Beral, Christophe | |
| dc.contributor.author | Philipsen, Vicky | |
| dc.contributor.imecauthor | Carballo, V. M. Blanco | |
| dc.contributor.imecauthor | Roy, S. | |
| dc.contributor.imecauthor | Chowrira, B. | |
| dc.contributor.imecauthor | Pham, T. | |
| dc.contributor.imecauthor | Wouters, J. | |
| dc.contributor.imecauthor | Das, S. | |
| dc.contributor.imecauthor | Decoster, S. | |
| dc.contributor.imecauthor | Leray, P. | |
| dc.contributor.imecauthor | Liu, R. G. | |
| dc.contributor.imecauthor | Ronse, K. | |
| dc.contributor.imecauthor | Vandenberghe, G. | |
| dc.contributor.imecauthor | Niroomand, A. | |
| dc.contributor.imecauthor | Foubert, P. | |
| dc.contributor.imecauthor | Rutigliani, V. D. | |
| dc.contributor.imecauthor | Suh, H. S. | |
| dc.contributor.imecauthor | Gupta, M. | |
| dc.contributor.imecauthor | de Simone, D. | |
| dc.contributor.imecauthor | Dusa, M. | |
| dc.contributor.imecauthor | Beral, C. | |
| dc.contributor.imecauthor | Philipsen, V. | |
| dc.date.accessioned | 2025-08-29T03:57:12Z | |
| dc.date.available | 2025-08-29T03:57:12Z | |
| dc.date.issued | 2024 | |
| dc.identifier.doi | 10.1117/12.3047176 | |
| dc.identifier.eisbn | 978-1-5106-8158-3 | |
| dc.identifier.isbn | 978-1-5106-8157-6 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/46128 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | 1321604 | |
| dc.source.conference | 2024 Conference on Photomask Technology | |
| dc.source.conferencedate | 2024-09-29 | |
| dc.source.conferencelocation | Monterey | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 9 | |
| dc.title | Logic and memory patterning breakthrough using High-NA lithography | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: | ||