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Cu/Low-k thickness measurement for advanced Cu CMP process development and control
Publication:
Cu/Low-k thickness measurement for advanced Cu CMP process development and control
Date
2009-03
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Li, Yunlong
;
Heylen, Nancy
;
Delande, Tinne
;
Kellens, Kristof
;
Ong, Patrick
;
Leunissen, Peter
;
Tarnowka, Alexandre
;
Eliyahu, Aviv
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2014
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations
Metrics
Views
2014
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations