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Exploring double patterning approaches for 22-nm half-pitch gate structures

Date

2008
Proceedings Paper
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dc.contributor.authorLocorotondo, Sabrina
dc.contributor.authorVangoidsenhoven, Diziana
dc.contributor.authorWouters, Johan M. D.
dc.contributor.authorMiller, Andy
dc.contributor.authorDemand, Marc
dc.contributor.authorBoullart, Werner
dc.contributor.imecauthorLocorotondo, Sabrina
dc.contributor.imecauthorVangoidsenhoven, Diziana
dc.contributor.imecauthorWouters, Johan M. D.
dc.contributor.imecauthorMiller, Andy
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.accessioned2021-10-17T08:29:41Z
dc.date.available2021-10-17T08:29:41Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14057
dc.source.beginpage17
dc.source.conference30th International Dry Process Symposium
dc.source.conferencedate26/11/2008
dc.source.conferencelocationTokyo Japan
dc.source.endpage18
dc.title

Exploring double patterning approaches for 22-nm half-pitch gate structures

dc.typeProceedings paper
dspace.entity.typePublication
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