Publication:

Retention, disturb and variability improvements enabled by local chemical-potential tuning and controlled hour-glass filament shape in a novel W\WO3\Al2O3\Cu CBRAM

Date

2016
Proceedings Paper
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dc.contributor.authorGoux, Ludovic
dc.contributor.authorBelmonte, Attilio
dc.contributor.authorCelano, Umberto
dc.contributor.authorWoo, Jiyong
dc.contributor.authorFolkersma, Steven
dc.contributor.authorChen, Michael
dc.contributor.authorRedolfi, Augusto
dc.contributor.authorFantini, Andrea
dc.contributor.authorDegraeve, Robin
dc.contributor.authorClima, Sergiu
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorJurczak, Gosia
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorBelmonte, Attilio
dc.contributor.imecauthorCelano, Umberto
dc.contributor.imecauthorFolkersma, Steven
dc.contributor.imecauthorRedolfi, Augusto
dc.contributor.imecauthorFantini, Andrea
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorClima, Sergiu
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.contributor.orcidimecCelano, Umberto::0000-0002-2856-3847
dc.contributor.orcidimecClima, Sergiu::0000-0002-4044-9975
dc.date.accessioned2021-10-23T10:59:28Z
dc.date.available2021-10-23T10:59:28Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26659
dc.identifier.urlhttp://ieeexplore.ieee.org/document/7573404/
dc.source.beginpage1
dc.source.conferenceIEEE Symposium on VLSI Technology
dc.source.conferencedate16/05/2016
dc.source.conferencelocationHonolulu, HI USA
dc.source.endpage2
dc.title

Retention, disturb and variability improvements enabled by local chemical-potential tuning and controlled hour-glass filament shape in a novel W\WO3\Al2O3\Cu CBRAM

dc.typeProceedings paper
dspace.entity.typePublication
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