Trends in advanced wet cleaning technologies, challenges in the removal of nanoparticles

dc.contributor.author	Holsteyns, Frank
dc.contributor.author	Vereecke, Guy
dc.contributor.author	Arnauts, Sophia
dc.contributor.author	Mertens, Paul
dc.contributor.imecauthor	Holsteyns, Frank
dc.contributor.imecauthor	Vereecke, Guy
dc.contributor.imecauthor	Arnauts, Sophia
dc.contributor.imecauthor	Mertens, Paul
dc.contributor.orcidimec	Vereecke, Guy::0000-0001-9058-9338
dc.date.accessioned	2021-10-15T13:53:38Z
dc.date.available	2021-10-15T13:53:38Z
dc.date.issued	2004
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/9049
dc.source.conference	Advanced Wet Cleans in Semiconductor Manufacturing Mykrolis Seminar
dc.source.conferencedate	15/09/2004
dc.source.conferencelocation	Dresden Germany
dc.title	Trends in advanced wet cleaning technologies, challenges in the removal of nanoparticles
dc.type	Proceedings paper
dspace.entity.type	Publication
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