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Resistivity scaling in metallic thin films and nanowires due to grain boundary and surface roughness scattering

Date

2017
Journal article
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dc.contributor.authorMoors, Kristof
dc.contributor.authorSoree, Bart
dc.contributor.authorMagnus, Wim
dc.contributor.imecauthorSoree, Bart
dc.contributor.imecauthorMagnus, Wim
dc.contributor.orcidimecSoree, Bart::0000-0002-4157-1956
dc.date.accessioned2021-10-24T09:36:15Z
dc.date.available2021-10-24T09:36:15Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29018
dc.identifier.urlhttp://dx.doi.org/10.1016/j.mee.2016.10.015
dc.source.beginpage37
dc.source.endpage41
dc.source.issue5
dc.source.journalMicroelectronic Engineering
dc.source.volume167
dc.title

Resistivity scaling in metallic thin films and nanowires due to grain boundary and surface roughness scattering

dc.typeJournal article
dspace.entity.typePublication
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