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Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry
Publication:
Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry
Date
2023-04-28
Proceedings Paper
https://doi.org/http://dx.doi.org/10.1117/12.2658359
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Dorney, Kevin
;
Kissoon, Nicola
;
Holzmeier, Fabian
;
Witting Larsen, Esben
;
Singh, Dhirendra
;
Arvind, Shikhar
;
Santra, Sayantani
;
Fallica, Roberto
;
Makhotkin, Igor
;
Philipsen, Vicky
;
De Gendt, Stefan
;
Fleischmann, Claudia
;
van der Heide, Paul
;
Petersen, John
Journal
Proc. SPIE 12494, Optical and EUV Nanolithography XXXVI
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Downloads
426
since deposited on 2023-05-22
199
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Views
1362
since deposited on 2023-05-22
439
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations