Publication:

Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry

Date

2023-04-28
Proceedings Paper
https://doi.org/http://dx.doi.org/10.1117/12.2658359
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Accepted version 952.35 KB

Author(s)

Dorney, Kevin  
;
Kissoon, Nicola
;
Holzmeier, Fabian  
;
Witting Larsen, Esben  
;
Singh, Dhirendra  
;
Arvind, Shikhar  
;
Santra, Sayantani  
;
Fallica, Roberto  
;
Makhotkin, Igor  
;
Philipsen, Vicky  
;
De Gendt, Stefan  
;
Fleischmann, Claudia  
;
van der Heide, Paul  
;
Petersen, John  

Journal

Proc. SPIE 12494, Optical and EUV Nanolithography XXXVI

Abstract

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1125 since deposited on 2023-05-22
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