Publication:
Characterization of low-k dielectric films by ellipsometric porosimetry
Date
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.contributor.author | Mogilnikov, K. P. | |
| dc.date.accessioned | 2021-10-14T16:36:39Z | |
| dc.date.available | 2021-10-14T16:36:39Z | |
| dc.date.issued | 2001 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5036 | |
| dc.source.beginpage | D4.2.1 | |
| dc.source.conference | Materials, Technology, and Reliability for Advanced Interconnects and Low-k Dielectrics | |
| dc.source.conferencedate | 23/04/2000 | |
| dc.source.conferencelocation | San Francisco, CA USA | |
| dc.source.endpage | D4.2.12 | |
| dc.title | Characterization of low-k dielectric films by ellipsometric porosimetry | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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