Publication:

Gate-All-Around nanowire & nanosheet FETs for advanced, ultra-scaled technologies (Keynote)

Date

2020
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dc.contributor.authorVeloso, Anabela
dc.contributor.authorMatagne, Philippe
dc.contributor.authorJang, Doyoung
dc.contributor.authorHuynh Bao, Trong
dc.contributor.authorVaisman Chasin, Adrian
dc.contributor.authorSimoen, Eddy
dc.contributor.authorEneman, Geert
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorMertens, Hans
dc.contributor.authorHoriguchi, Naoto
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorMatagne, Philippe
dc.contributor.imecauthorJang, Doyoung
dc.contributor.imecauthorVaisman Chasin, Adrian
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecVaisman Chasin, Adrian::0000-0002-9940-0260
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-29T07:04:12Z
dc.date.available2021-10-29T07:04:12Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36233
dc.identifier.urlhttps://doi.org/10.1149/MA2020-01241369mtgabs
dc.source.beginpage1396
dc.source.conferenceSymposium H02 - "Advanced CMOS-Compatible Semiconductor Devices 19" of the 237th ECS Meeting
dc.source.conferencedate10/05/2020
dc.source.conferencelocationBristol UK
dc.title

Gate-All-Around nanowire & nanosheet FETs for advanced, ultra-scaled technologies (Keynote)

dc.typeMeeting abstract
dspace.entity.typePublication
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