Publication:

Plasma doping control by mass metrology

Date

2008
Proceedings Paper
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dc.contributor.authorEveraert, Jean-Luc
dc.contributor.authorZschaetzsch, Gerd
dc.contributor.authorVecchio, Emma
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCunnane, Liam
dc.contributor.imecauthorEveraert, Jean-Luc
dc.contributor.imecauthorVecchio, Emma
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-10-17T07:03:37Z
dc.date.available2021-10-17T07:03:37Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13710
dc.source.beginpage113
dc.source.conference16th Annual IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP
dc.source.conferencedate30/09/2008
dc.source.conferencelocationLas Vegas, NV USA
dc.source.endpage116
dc.title

Plasma doping control by mass metrology

dc.typeProceedings paper
dspace.entity.typePublication
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