Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
Analysis of As, P diffusion and defect evolution during sub-millisecond non-melt laser annealing based on an atomistic kinetic Monte Carlo approach
Publication:
Analysis of As, P diffusion and defect evolution during sub-millisecond non-melt laser annealing based on an atomistic kinetic Monte Carlo approach
Date
2007
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
14603.pdf
472.51 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Noda, Taiji
;
Vandervorst, Wilfried
;
Felch, S.
;
Parihar, V.
;
Cuperus, Aldert
;
Mcintosh, R.
;
Vrancken, Christa
;
Rosseel, Erik
;
Bender, Hugo
;
Van Daele, Benny
;
Niwa, Masaaki
;
Umimoto, H.
;
Schreutelkamp, Rob
;
Absil, Philippe
;
Jurczak, Gosia
;
De Meyer, Kristin
;
Biesemans, Serge
;
Hoffmann, Thomas Y.
Journal
Abstract
Description
Metrics
Views
1956
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1956
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations