Publication:

Plasma process induced physical damage on ultra thin gate oxide

Date

1998
Presentation
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dc.contributor.authorLee, Hean-Cheal
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.accessioned2021-09-30T12:32:47Z
dc.date.available2021-09-30T12:32:47Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2714
dc.source.conferencePlasma Processing XII; 4-8 May 1998; San Diego, CA, USA.
dc.source.conferencelocation
dc.title

Plasma process induced physical damage on ultra thin gate oxide

dc.typeOral presentation
dspace.entity.typePublication
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