Mechanisms for the trimethylaluminum reaction in aluminum oxide atomic layer deposition on sulfur passivated germanium

dc.contributor.author	Delabie, Annelies
dc.contributor.author	Sioncke, Sonja
dc.contributor.author	Rip, Jens
dc.contributor.author	Van Elshocht, Sven
dc.contributor.author	Caymax, Matty
dc.contributor.author	Pourtois, Geoffrey
dc.contributor.author	Pierloot, Kristine
dc.contributor.imecauthor	Delabie, Annelies
dc.contributor.imecauthor	Rip, Jens
dc.contributor.imecauthor	Van Elshocht, Sven
dc.contributor.imecauthor	Caymax, Matty
dc.contributor.imecauthor	Pourtois, Geoffrey
dc.contributor.orcidimec	Van Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimec	Pourtois, Geoffrey::0000-0003-2597-8534
dc.date.accessioned	2021-10-19T13:12:18Z
dc.date.available	2021-10-19T13:12:18Z
dc.date.issued	2011
dc.identifier.issn	1932-7447
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/18823
dc.source.beginpage	17523
dc.source.endpage	17532
dc.source.issue	35
dc.source.journal	Journal of Physical Chemistry C
dc.source.volume	115
dc.title	Mechanisms for the trimethylaluminum reaction in aluminum oxide atomic layer deposition on sulfur passivated germanium
dc.type	Journal article
dspace.entity.type	Publication
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