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Difference in the nonlinear optical response of epitaxial Si on Ge(001) grown from SiH4 at 500 °C and from Si3H8 at 350 °C
Publication:
Difference in the nonlinear optical response of epitaxial Si on Ge(001) grown from SiH4 at 500 °C and from Si3H8 at 350 °C
Date
2008
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Valev, Ventsislav
;
Leys, Frederik
;
Caymax, Matty
;
Verbiest, Thierry
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1984
since deposited on 2021-10-17
Acq. date: 2025-10-27
Citations
Metrics
Views
1984
since deposited on 2021-10-17
Acq. date: 2025-10-27
Citations