Publication:

Subnanometer linewidth uniformity in silicon nanophotonic waveguide devices using CMOS fabrication technology

Date

2010
Journal article
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dc.contributor.authorSelvaraja, Shankar
dc.contributor.authorBogaerts, Wim
dc.contributor.authorDumon, Pieter
dc.contributor.authorVan Thourhout, Dries
dc.contributor.authorBaets, Roel
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.imecauthorBaets, Roel
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.contributor.orcidimecBaets, Roel::0000-0003-1266-1319
dc.date.accessioned2021-10-18T21:26:35Z
dc.date.available2021-10-18T21:26:35Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.issn1077-260X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17969
dc.source.beginpage316
dc.source.endpage324
dc.source.issue1
dc.source.journalIEEE Journal of Selected Topics in Quantum Electronics
dc.source.volume16
dc.title

Subnanometer linewidth uniformity in silicon nanophotonic waveguide devices using CMOS fabrication technology

dc.typeJournal article
dspace.entity.typePublication
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