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Articles
Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling
Publication:
Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling
Date
2023
Journal article
https://doi.org/10.1117/1.JMM.22.4.041603
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wei, Chih-, I
;
Kang, Seulki
;
Das, Sayantan
;
Oya, Masahiro
;
Okamoto, Yosuke
;
Maruyama, Kotaro
;
Fenger, Germain
;
Latypov, Azat
;
Kusnadi, Ir
;
Khaira, Gurdaman
;
Yamazaki, Yuichiro
;
Gillijns, Werner
;
Halder, Sandip
;
Lorusso, Gian
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
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899
since deposited on 2024-02-27
Acq. date: 2025-10-27
Citations
Metrics
Views
899
since deposited on 2024-02-27
Acq. date: 2025-10-27
Citations