Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling

Wei, Chih-, I; Kang, Seulki; Das, Sayantan; Oya, Masahiro; Okamoto, Yosuke; Maruyama, Kotaro; Fenger, Germain; Latypov, Azat; Kusnadi, Ir; Khaira, Gurdaman; Yamazaki, Yuichiro; Gillijns, Werner; Halder, Sandip; Lorusso, Gian

doi:10.1117/1.jmm.22.4.041603

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Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling

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2023

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https://doi.org/10.1117/1.jmm.22.4.041603

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JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3

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910 since deposited on 2024-02-27

Acq. date: 2026-09-11

Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling

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