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Progress and challenges of 193nm and EUV lithography for sub-32nm scaling
Publication:
Progress and challenges of 193nm and EUV lithography for sub-32nm scaling
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Date
2010
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21404.pdf
3.53 MB
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ronse, Kurt
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Abstract
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Views
1838
since deposited on 2021-10-18
1
last month
1
last week
Acq. date: 2026-02-26
Citations