Publication:

Comparison of the stability of the surface structure and H-termination of the H2 annealed and HF-last cleaned (100) silicon

Date

1994
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorBender, Hugo
dc.contributor.authorLi, Li
dc.contributor.authorMertens, Paul
dc.contributor.authorCaymax, Matty
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorHeyns, Marc
dc.date.accessioned2021-09-29T12:39:47Z
dc.date.available2021-09-29T12:39:47Z
dc.date.embargo9999-12-31
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35
dc.source.beginpage355
dc.source.conferenceProceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate19/09/1994
dc.source.conferencelocationBrugge Belgium
dc.source.endpage358
dc.title

Comparison of the stability of the surface structure and H-termination of the H2 annealed and HF-last cleaned (100) silicon

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
27.pdf
Size:
153.5 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions