Publication:

Tolerance control for photonic crystal structures fabricated with deep UV lithography

Date

2003-09
Proceedings Paper
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dc.contributor.authorBogaerts, Wim
dc.contributor.authorDumon, Pieter
dc.contributor.authorWiaux, Vincent
dc.contributor.authorWouters, Johan M. D.
dc.contributor.authorBeckx, Stephan
dc.contributor.authorBaets, Roel
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorWouters, Johan M. D.
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorBaets, Roel
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.contributor.orcidimecBaets, Roel::0000-0003-1266-1319
dc.date.accessioned2021-10-15T04:02:40Z
dc.date.available2021-10-15T04:02:40Z
dc.date.embargo9999-12-31
dc.date.issued2003-09
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7233
dc.source.beginpage46
dc.source.conferenceProceedings 29th European Conference on Optical Communication - ECOC
dc.source.conferencedate21/09/2003
dc.source.conferencelocationRimini Italy
dc.source.endpage47
dc.title

Tolerance control for photonic crystal structures fabricated with deep UV lithography

dc.typeProceedings paper
dspace.entity.typePublication
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