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Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing
Publication:
Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing
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Date
1998
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ercken, Monique
;
Pollers, Ingrid
;
Van Puyenbroeck, Ilse
;
Goethals, Mieke
;
Ronse, Kurt
;
Pawlowski, G.
;
Spiess, Walter
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1982
since deposited on 2021-09-30
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last month
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last week
Acq. date: 2025-12-10
Citations
Metrics
Views
1982
since deposited on 2021-09-30
1
last month
1
last week
Acq. date: 2025-12-10
Citations